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Surface Energy Controlled Growth of Single Crystalline Two-Dimensional Hexagonal (H)-Boron Nitride

14th IEEE International Conference on Nanotechnology(2014)

Cited 1|Views20
Key words
III-V semiconductors,boron compounds,catalysis,chemical vapour deposition,nanofabrication,nanostructured materials,semiconductor growth,semiconductor thin films,surface morphology,surface roughness,wide band gap semiconductors,BN,CVD grown hexagonal-boron nitride films,atomic layer growth process,catalytic growth,catalytic surface morphology,chemical vapor deposition,domain size,electronic properties,graphene,growth kintectics,mechanical properties,single crystalline two-dimensional hexagonal-boron nitride,surface energy controlled growth,surfcae roughness,thermal properties,two-dimensional nanomaterial
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