Multitarget sputtering of PZT-containing mixed oxide thin films onto copper-coated Kapton substrates

A Kleiner,G Suchaneck,A Dejneka,L Jastrabik,V Lavrentiev,D A Kiselev,Gerald Gerlach

Oxide Materials for Electronic Engineering（2014）

Cited 1|Views9

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Abstract

Large area film deposition was performed by means of multitarget reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr) onto Cu-coated Kapton HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.

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Key words

rutherford backscattering,x-ray photoelectron spectra,lead compounds,nanofabrication,nanostructured materials,piezoelectric thin films,sputter deposition,pfm,pzt,pzt-containing mixed oxide thin films,res,xps,copper-coated kapton substrates,high-power pulse sputtering,large area film deposition,multitarget reactive magnetron sputtering,piezoelectric properties,size 200 nm,complex oxide film deposition,composition profile,flexible polymer substrate,multitarget reactive sputtering,piezoresponse force microscopy

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