4H-SiC N-Channel JFET for Operation in High-Temperature Environments

Electron Devices Society, IEEE Journal of the  (2014)

引用 29|浏览6
暂无评分
摘要
Lateral depletion-mode 4H-SiC n-channel junction field-effect transistors (JFETs) are demonstrated to operate with well-behaved electrical characteristics at temperatures up to 600°C in air. Ti/Ni/TiW metal stacks are used to form ohmic contacts to n-type 4H-SiC with specific contact resistance of 1.14 × 10-3 Ω cm2 at 600°C. The on/off drain saturation current ratio and intrinsic gain at 600°C are 1.53 × 103 and 57.2, respectively. These results indicate that 4H-SiC JFETs can be used for extremely-high-temperature electronics applications.
更多
查看译文
关键词
contact resistance,junction gate field effect transistors,nickel,ohmic contacts,silicon compounds,titanium compounds,wide band gap semiconductors,4h-sic n-channel junction field-effect transistors,sic,ti-ni-tiw,extremely-high-temperature electronics applications,lateral depletion-mode 4h-sic n-channel jfet,metal stacks,on-off drain saturation current ratio,temperature 600 c,well-behaved electrical characteristics,high-temperature electronics,junction field effect transistor (jfet),silicon carbide (sic),temperature,logic gates,metals,temperature measurement
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要