Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation

Giovanni Mecalco,C Acostazepeda,J L Hernandezpozos,Nikola Batina,I Moralesreyes,Jorn Bonse,Emmanuel Haroponiatowski

Lasers and Electro-Optics（2014）

Cited 6|Views11

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Abstract

Single-pulse (532 nm, 10 ns) micropatterning of silicon surfaces through a pinhole is demonstrated using scanning electron and atomic force microscopy. The results are compared to the Fresnel diffraction theory and physical mechanisms are discussed.

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Key words

atomic force microscopy,elemental semiconductors,laser materials processing,scanning electron microscopy,silicon,surface treatment,fresnel diffraction theory,si,diffraction-assisted micropatterning,ns-laser irradiation,physical mechanisms,pinhole,silicon surfaces,single-pulse micropatterning,time 10 ns,wavelength 532 nm

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