A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry

Electron Devices, IEEE Transactions  (2014)

引用 15|浏览1
暂无评分
摘要
Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this paper, we demonstrate that using the unique quasi-linear relationship between the surface potentials, it is possible to develop compact model for CDG-MOSFETs without such approximation while preserving the mathematical complexity at the same level of the existing models. In the proposed model, the surface potential relationship is used to include the drain-induced barrier lowering, channel length modulation, velocity saturation, and quantum mechanical effect in the long-channel model and good agreement is observed with the technology computer aided design simulation results.
更多
查看译文
关键词
mosfet,computational complexity,technology cad (electronics),cdg-mosfet,channel length modulation,drain-induced barrier lowering,gate oxide thickness asymmetry,long-channel model,mathematical complexity,quantum mechanical effect,quasi-linear relationship,short-channel common double-gate mosfet model,surface potentials,technology computer aided design simulation,velocity saturation,compact modeling,mosfet.,double gate (dg)
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要