Co-design of ESD protection and LNA in RFIC

ASICON(2013)

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Abstract
This paper introduces a new FoM (figure of merit) to evaluate the overall performance of ESD and LNA and presents a design procedure of establishing a standard library of ESD protection cells to reduce the design time and complexity for RFIC designer. The electrostatic discharge protection cells have been designed in a 0.35μm BiCMOS process. The ESD robustness and RF characteristics will be verified when the RF chip is done.
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Key words
lna,low noise amplifiers,rfic,bicmos analogue integrated circuits,radiofrequency integrated circuits,figure of merit,esd protection,size 0.35 mum,electrostatic discharge protection,integrated circuit design,electrostatic discharge,bicmos process,fom
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