Occurrence of Resistive Switching and Threshold Switching in Atomic Layer Deposited Ultrathin (2 nm) Aluminium Oxide Crossbar Resistive Random Access Memory

Electron Device Letters, IEEE  (2015)

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摘要
Resistive random access memory (RRAM) is a promising emerging nonvolatile memory which offer high density integration in the form of cross-bar array design. Selector devices are a vital requirement to suppress the cross-talk issue. In this letter, we are going to demonstrate the coexistence of resistive switching (RS) and threshold switching (TS) in an ultrathin 2-nm Aluminium oxide (AlOx)-based crossbar RRAM devices. Depending on current level the device itself can switch from TS to RS mode with a nonlinearity of > 102. Stable TS of > 103 cycles has been achieved at 10 nA. Achievements of this letter offers the usability of 2-nm AlOx RRAM devices as a selector and as a memory device for high density crossbar array integration.
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关键词
aluminium compounds,atomic layer deposition,resistive ram,switching circuits,alox,rram device,rs,ts,atomic layer deposited ultrathin aluminium oxide crossbar array design,cross-talk suppression,current 10 na,nonvolatile memory,resistive random access memory,resistive switching,size 2 nm,threshold switching,rram,cross-bar,current compliance,resistance,tunneling,switches,tin
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