Structural and optical properties of ZnO films grown by two-step method using MOCVD

Structural and optical properties of ZnO films, grown on Si(111) and prepared via two-step method by MOCVD using diethylzinc and H2O as reactant gases, are studied using XRD, PL and AFM. For samples using two-step method, excellent crystallization quality and optical properties were obtained. Moreover, as increasing the growth temperature, the properties of ZnO films were improved further. AFM results indicated that the RMS of ZnO films using two-step method were all about 7.0 nm. Compared with the samples using single-step method, there is no obviously variation of RMS as increased the growth temperature for samples grown by two-step method.