基于Gabor相位和局部二值模式的AAM纹理表示
Xi Tong Gong Cheng Yu Dian Zi Ji Shu/Systems Engineering and Electronics（2010）
Abstract
提出一种基于Gabor相位与局部二值模式(local binary patterns,LBP)算子的活动表观模型(activeappearance model,AAM)。与基于亮度的AAM相比,改进模型在三个方面提高了算法性能:提供多尺度多方向的Gabor纹理,提高了模型的匹配精度;增强了对外部环境变化(如光照)的鲁棒性;基于LBP的纹理编码去除了大量冗余。实验结果表明该模型能够有效提高模型的匹配精度。
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Key words
Active appearance model,Gabor phase feature,Local binary pattern,Texture modeling
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