Light emission from Si LED controlling by a gate voltage and SOS tunneling junction
Proceedings of SPIE-The International Society for Optical Engineering(2010)
Abstract
A novel Si LED with three terminals has been designed and fabricated compatible completely with standard n-well CMOS technology. It is composed by a combination of a forward biased p(+)-n junction controlling by gate voltage and a poly-Si/ultrathin oxide/Si tunneling junction. The experimental results demonstrates that: (1) The optical emitting power of LED increases with both forward p(+)-n junction current increasing and positive gate voltage increasing; (2) The optical emitting power of LED still increases with gate Voltage increasing while p(+)-n junction forward current at zero; (3) The spectra of the optical output power on wavelength lambda occurs a peak near 1000nm. The results can be explained from the enhancement on the p-n junction forward current by the gate voltage induced barrier lowering effect and the S(poly-Si) OS tunneling junction theory.
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Key words
Silicon LED,Light intensity controlling,Three terminals LED,SOS tunneling,Forward biased light emitting,CMOS technology,Barrier lowering effect,Infrared light emission
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