深亚微米三栅FinFET短沟道效应和拐角效应计算机模拟分析

Gongneng Cailiao/Journal of Functional Materials(2009)

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Abstract
利用三维器件模拟软件,研究了深亚微米三栅FinFET的短沟道效应,并模拟了阈值电压和亚阈值摆幅随硅鳍(fin)厚度和高度的变化情况.通过优化硅鳍厚度或高度,可以有效的控制短沟道效应.在进一步对深亚微米三栅FinFET的拐角效应进行二维数值模拟的过程中,并未观察到由拐角效应引起的泄漏电流.与传统的体硅CMOS结构有所不同,拐角效应并未使得深亚微米三栅FinFET性能变差,反而提高了其电学性能.
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Key words
Corner effect,Short-channel effect,Subthreshold swing,Triple-FinFET
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