NiTi形状记忆合金薄膜的残余应力
Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University（2001）
Abstract
采用X射线掠射法和轮廓法，测量了单晶Si基板上用磁控溅射法制备的NiTi形状记忆合金薄膜的残余应力，分析了其与薄膜厚度以及晶化处理温度等工艺条件的关系.结果表明：该薄膜中的残余应力主要来源于薄膜同基板材料的膨胀系数和晶格参数不匹配；薄膜厚度越大，残余应力越小；晶化处理温度对因热胀系数差异带来的热拉应力因马氏体相变而致的相变压应力均有不同程度的影响.
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Key words
NiTi,Residual stress,Shape memory alloys,Thin film
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