Chemical deposition decoration in the metallography of near-alpha titanium alloy
RARE METAL MATERIALS AND ENGINEERING(2000)
Abstract
Common water-base etching reagents can not effectively etch the grain boundaries of some near-a titanium alloys. On the other hand, chemical deposition is able to display the grain morphologies vividly and completely. Furthermore, twinned crystal morphologies can also be revealed thoroughly using the chemical deposition technique. Based on many test results, colorful photographs of metallographic structure have been made using two ingredients of chemical deposition. The technique is also applicable to black-and-white photography.
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Key words
grain boundary,chemical deposition,near-alpha titanium alloy
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