Design of pulse magnetron sputtering deposition control system based on multifunction controller

A new design technique about pulse magnetron sputtering control system Which bases on multifunction controller and automatic control theory is proposed. This system includes a host PC, a gust multifunctional controller and the local instruments. It controls the process of films deposition automatically and it is also composed of three models corresponding for different operational requests. The characteristic of sputtering deposition films shows the steadily and effectively advantages in this technique.