Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films
Applied Surface Science(2013)
摘要
•Influence of oxygen pressure and temperature on AlF3 films was characterized.•Alumina was detected and the formation mechanism was analyzed.•Samples prepared with oxygen contain more alumina, and the mechanical stress was reduced.•By introducing oxygen, extinctive coefficient was reduced and the refractive index was increased.•Samples prepared with certain oxygen pressure tend to be more laser resistant.
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关键词
Aluminum fluoride,Optical constants,Laser-induced damage threshold
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