Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films

Xu Li,Weili Zhang,Jian Sun,Jie Liu,Yongqiang Hou,Ling Lin,Kai He,Kui Yi

Applied Surface Science（2013）

引用 8|浏览19

暂无评分

摘要

•Influence of oxygen pressure and temperature on AlF3 films was characterized.•Alumina was detected and the formation mechanism was analyzed.•Samples prepared with oxygen contain more alumina, and the mechanical stress was reduced.•By introducing oxygen, extinctive coefficient was reduced and the refractive index was increased.•Samples prepared with certain oxygen pressure tend to be more laser resistant.

查看译文

关键词

Aluminum fluoride,Optical constants,Laser-induced damage threshold

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要