Study On The Technology Of The High Power Xef(C-A) Laser With Repetition Mode

This paper presents the results of studies on high power photochemical XeF(C-A) laser with repetition mode. A new design of optical pumping source is proposed and the deposition efficiency is higher than 75 %. The form process and the temporal and spatial characteristics of the XeF2 photodissociation wave are studied experimentally. The results indicate that when the deposition power is 12.5 MW/cm, the maximum brightness temperature reaches more than 25 kK and the photon flux obtained more than 4x10(23) photon s(-1) cm(-2) in the VUV range of 130 nm similar to 180 nm. A novel XeF(C-A) laser which can be operated in repetition mode has been developed based on surface discharge optical pumping technique. The ideal output energy results of 20 laser pulses are presented under different repetitive rates and their optimal experimental conditions. Output energies of more than 4J and better stability can be obtained when the laser device operates at 1, 2 and 5 Hz, respectively. When the gas feed rate is larger than 53L/s, the average energy of 20 laser pulses is up to 3.2J at the repetitive rate of 10Hz. The technology for the laser spectral narrowing is studied.