Simultaneous diagnostics of electron density and temperature in micoplasma reactor for scanning plasma etching
Nanotechnology（2013）
Abstract
Microplasma has been applied widely in micro fabrication. The diagnostics of microplasma generated in the scanning plasmas etching system is critical during the system operation. An experimental system is setup to investigate microplasma parameters of the dc-driven microplasmas reactor operating in CHF3 reactive gases at different gas pressure. The electron density and temperature was calculated from the optical emission spectral (OES) of the microplasmas based on Stark broadening of the Balmer lines of the hydrogen, Hβ and Hγ. The results of this paper may provide experimental verification for the optimized design of operative conditions of microplasmas reactor.
MoreTranslated text
Key words
Stark effect,electron density,microfabrication,microreactors,plasma chemistry,plasma confinement,plasma density,plasma diagnostics,plasma pressure,plasma production,plasma temperature,sputter etching,CHF3 reactive gases,OES,Stark broadening,dc-driven microplasma reactor,electron density,electron temperature,gas pressure,hydrogen Balmer lines,microfabrication,microplasma generation diagnostics,microplasma parameter,optical emission spectral,scanning plasma etching system,simultaneous diagnostics,system operation,
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined