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Research On Thinning Technology With Wing Pattern

Dawei Shi,Guo Jian,Chen Xu,Xiaohui Jiang,Lianjie Qu,Dong Yang,Tao Wu,TaeYu Min

IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 1（2012）

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Abstract
To realize higher resolution, narrow frame, lower power consumption, subject to the condition of equipment, it is difficult to get narrow spacing. In this paper, we change normal line to wing line in mask, and realize further narrow space in the existing condition.
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Key words
Thinning, Wing pattern, Photo process
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