Deposition of cubic boron nitride films using DC arc discharge

physica status solidi (a)Volume 151, Issue 1 p. K1-K3 Short Note Deposition of cubic boron nitride films using DC arc discharge Kejun Liao, Kejun Liao Department of Physics, Lanzhou University Search for more papers by this authorWanlu Wang, Wanlu Wang Department of Physics, Lanzhou University Search for more papers by this author Kejun Liao, Kejun Liao Department of Physics, Lanzhou University Search for more papers by this authorWanlu Wang, Wanlu Wang Department of Physics, Lanzhou University Search for more papers by this author First published: 16 September 1995 https://doi.org/10.1002/pssa.2211510129Citations: 3 Lanzhou 730000, People's Republic of China. AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat No abstract is available for this article. References 1 A. C. Admas and C. D. Capio, J. Electrochem. Soc. 127, 399 (1980). 10.1149/1.2129678 CASWeb of Science®Google Scholar 2 M. Staou and F. Fjjimoto, Japan. J. appl. Phys. 22, L171 (1983). 10.1143/JJAP.22.L171 Web of Science®Google Scholar 3 R. C. Devrices, NTIS AD Report 903, 33015 (1972). Google Scholar 4 J. T. Wang and J. O. Carisson, Surface and Coating Technol. 43/44, 1 (1990). 10.1016/0257-8972(90)90054-G Web of Science®Google Scholar 5 F. P. Bundy and R. H. Wentorf, J. chem. Phys. 38, 1144 (1963). 10.1063/1.1733815 CASWeb of Science®Google Scholar 6 M. Meno and T. Yosida, Japan. J. appl. Phys. 29, L1175 (1990). 10.1143/JJAP.29.L1175 Google Scholar 7 H. Saitoh and W. A. Yarbrough, Appl. Phys. Letters 58, 2228 (1991). 10.1063/1.105236 CASWeb of Science®Google Scholar 8 A. Chayshaya, H. Yokoyama, T. Imura, and Y. Osaka, Japan. J. appl. Phys. 26, L1435 (1987). 10.1143/JJAP.26.L1435 Google Scholar 9 T. Ikebe, Y. Kawate, and Y. Hiral, Japan. J. Vacuum Soc. 31, 786 (1988). Google Scholar 10 K. Inagawa, K. Watanabe, I. Tanaka, K. Satioh, and A. Itoh, Proc. 9th Symp. on ISIAT, Tokyo 1985. Google Scholar 11 S. Matsurnoto, M. Hino, and T. Kobayashi, Appl. Phys. Letters 51, 737 (1987). 10.1063/1.98851 Web of Science®Google Scholar 12 K. Kurihara, K. Sasaki, M. Kawarada, and N. Koshino, Appl. Phys. Letters 62, 432 (1988). Google Scholar 13 S. Ichinose, H. Saitoh, and T. Ichiguro, Proc. 11th Symp. on ISIAT, Tokyo 1987. Google Scholar 14 L. J. Liao and W. L. Wang, Chin. Phys. Letters 1, 58 (1995). Google Scholar 15 O. Barfman, G. Lengyel, and S. S. Mitra, Solid State Commun. 6, 523 (1968). 10.1016/0038-1098(68)90503-6 Web of Science®Google Scholar Citing Literature Volume151, Issue116 September 1995Pages K1-K3 ReferencesRelatedInformation