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Engineering and metrology of epitaxial graphene

Alexander Tzalenchuk,Samuel Lara-Avila,Karin Cedergren,Mikael Syväjärvi,Rositza Yakimova,Olga Kazakova,T.J.B.M. Janssen,Kasper Moth-Poulsen,Thomas Bjørnholm,Sergey Kopylov,Vladimir Fal’ko,Sergey Kubatkin

Solid State Communications（2011）

Cited 23|Views35
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Abstract
Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.
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Key words
A. Graphene,D. Quantum Hall effect,D. Photochemical gate,E. Metrology
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