Ion-sputtering deposition of Ca–P–O films for microscopic imaging of osteoblast cells
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms(2007)
Abstract
An ion-beam sputtering technique was used to produce Ca–P–O films on borosilicate glass at room temperature from hydroxyapatite targets using nitrogen, argon and krypton beams at different acceleration voltages. The sputtering target was pressed from high purity hydroxyapatite powder or mixture of high purity hydroxyapatite powder and red phosphorus in order to optimise the film composition.
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79.20.Rf,81.70.Jb,82.80.Yc
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