The Dose Effect in Secondary Electron Emission

Prashanth Kumar, Christopher Watts,Tengiz Svimonishvili,Mark Gilmore,Edl Schamiloglu

IEEE Transactions on Plasma Science（2009）

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摘要

In this paper, total incident electron dose as an inherent parameter in secondary electron emission is experimentally demonstrated. A completely automated experimental setup allows for measuring of secondary electron yield (SEY) as a function of beam energy, angle of incidence of primary electrons, electron dose, and time. SEY data are presented for copper, plasma-sprayed boron carbide, and titani...

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关键词

Electron emission,Electron beams,Plasma measurements,Dielectric materials,Semiconductor materials,Energy measurement,Time measurement,Particle beam measurements,Copper,Boron

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