Study of electron field emission and structural properties of nanostructured carbon thin films deposited by hot-filament-assisted reactive sputtering using methane gas
Vacuum(2002)
摘要
The electron field emission properties of the nanostructured carbon films were investigated. The films were deposited using an RF magnetron sputtering system with a hot filament. The target was a pure carbon disc and CH4 gas was introduced into the chamber to create plasma by applying an RF power of 100W at a relatively low pressure of 5×10−2Torr. The hot filament was made of tungsten wire, which was spiral-shaped and placed between the substrate and graphite target. The tungsten filament temperature was up to 2000°C during the deposition. Silicon, porous silicon (PS), and Pd-deposited PS (Pd/PS) were used as substrates on which the carbon films were formed at the temperature of 700°C. The characterizations of the films were investigated by scanning electron microscopy. Electron field emission of the films were characterized and an emission current density reached about 3.58×10−3A/cm2 at an electric field of 15V/μm for the carbon film deposited on Pd/PS substrate.
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关键词
RF magnetron sputtering,Methane gas,Field emission current density,Carbon films
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