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共面介质阻挡放电蒸发聚四氟乙烯沉积碳氟膜的研究

WANG Hui,WU Qing-hao,ZHU Ai-min

Journal of Northeast Normal University(Natural Science Edition)（2009）

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Abstract
首次将共面型介质阻挡放电(C-DBD)应用于蒸发聚四氟乙烯(PTFE)并沉积制备了碳氟膜,制备的碳氟膜尺寸为50~100 nm,其表面均方根(RMS)粗糙度为15.55 nm(测量面积为10μm×10μm)。发射光谱表明,C-DBD产生了能量较高的电子激发态Ar原子(12.9~13.5 eV)。该方法装置简单,在常温常压下操作,薄膜沉积速率快,而且环境友好.
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Key words
evaporation,CFx film,dielectric barrier discharge,PTFE
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