The Effect of the H2Flow Rate on the Deposition of TiO2Film Produced by Inductively Coupled Plasma-Assisted CVD
CHEMICAL VAPOR DEPOSITION(2009)
Abstract
Titanium dioxide (TiO2) films are produced by inductively coupled plasma-assisted (ICP) CVD at various H-2 flow rates. Anatase and rutile TiO2, films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO2 films are strongly affected by the H-2 flow rate. By plasma diagnostics, using a single Langmuir probe (SLP) and optical emission spectroscopy (OES), it is found that the amount of H-2 plays a dominant role in determining the deposition rate of the TiO2 films, while the substrate temperature or plasma density do not appreciably affect the deposition rate.
MoreTranslated text
Key words
Crystal structure,Hydrogen,ICP-CVD,TiCl4,Titanium dioxide
AI Read Science
Must-Reading Tree
Example
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined