Synthesis and characterization of hard ternary AlMgB composite films prepared by sputter deposition

Hard and superlight thin films laminated with boron carbide have been proposed as candidates for strategic use such as armor materials in military and space applications. Aluminum magnesium boride (AlMgB) films are excellent candidates for these purposes. We prepared AlMgB films by sputter deposition using multiple unbalanced planar magnetrons equipped with two boron and one AlMg targets. The film morphology changed and the film's root mean square (rms) roughness varied from 1.0 to 18nm as the power density of the AlMg target increased from 0.2 to 1.0W/cm2 while the power density of each boron target was maintained at 2W/cm2. Chemical analyses show dominating Al, Mg, B and trace elements of oxygen, carbon and argon. The film composition also varies with altering the power density supplied to the AlMg target. The film with an atomic ratio of Al:Mg:B=1.38:0.64:1 exhibits the highest hardness (~30GPa). This value surpasses the hardness of hydrogenated diamond-like carbon films (24–28GPa) prepared by plasma enhanced chemical vapor deposition.