A novel technique for the fabrication of sub-20nm metallic wires

Continuos metallic wires similar to 10nm in width have been fabricated. These have been achieved using a new technique which exploits the ability to form ultra fine trenches in the surface of a SiO2 layer using the irradiated SiO2 process. The complete process is described along with simulations of the process which enable the process to be optimised.