Structure and morphological study of nanometer W and W3O thin films
Thin Solid Films(2003)
摘要
In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm2. Two phases with different morphology have been observed: W3O with a nanograins structure is present in the first step of the tungsten growth; and, when the thickness is increased, a pure tungsten Wolfram phase (W) with a lamellar structure appears. We demonstrate that W3O is related to a pollution of the target surface between two growth runs. We succeed to suppress this phase and to obtain pure tungsten Wolfram nanolayer, in order to realize (W/WO3)n multilayer.
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关键词
RF-sputtering,Tungsten thin films,W3O micro structure,W micro structure,Atomic force microscopy,X-ray diffraction
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