电沉积Cu/Ni多层膜硬度与调制波长关系的研究
Journal of Henan University of Science & Technology(Natural Science)（2008）
Abstract
分别采用双槽法和单槽法制备了不同调制波长的Cu/Ni多层膜,研究了多层膜硬度与调制波长之间的关系。结果表明,当调制波长大于33nm时,硬度与调制波长的关系符合Hall-Petch关系式;小于33nm时,偏离了Hall-Petch关系式;等于21nm时,硬度出现了峰值,约为HV451.8。
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Key words
Electrodeposit,Hardness,Multilayer,Modulated wavelength
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