铁刻蚀CVD金刚石膜辅助机械抛光
Cemented Carbide（2007）
Abstract
采用直流溅射方法在化学气相沉积(CVD)金刚石膜表面镀上一层铁薄膜,在氢等离子体条件下利用铁对金刚石膜的快速刻蚀实现初抛光,然后再进行机械抛光,提高抛光效率。
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Key words
polishing,etching,CVD diamond film,microwave plasma
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