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旋转圆柱靶溅射沉积产额分布

Xiu-qing MENG,Shuang WANG,Hang SHANG,Hua-jing CHI,Ge CHEN,Qi-chu ZHANG

Vacuum（2010）

Cited 23|Views4
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Abstract
采用数值计算模型,计算了旋转圆柱靶溅射产额分布.数值计算中假设从靶溅射出来的粒子服从余弦函数定律.计算得到的单靶溅射产额分布和Al靶在Ar气压0.4Pa测量得到的实验值基本相同.同时计算了孪生旋转圆柱靶的溅射产额分别与靶基距、靶间距,以及靶旋转角度的相关性.
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Key words
deposition rate,rotating cylindrical target,sputtering pressure,twin target,magnetron sputtering
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