Stability of surface reconstructions on silicon during RT deposition of Si submonolayers

Surface reconstruction stability of different surface phases formed by Al and Sb on Si(111) and Si(100) surfaces has been studied by monitoring the attenuation of the low-energy electron diffraction normal and extra reflections during room temperature deposition of Si submonolayers. The variety of surface phases under consideration and extensive information background regarding their atomic structure have enabled us to recognize the relationship between the stability of surface phases and their structure.