Structural characterization of AlGaN/GaN superlattices by x-ray diffraction and Rutherford backscattering
Superlattices and Microstructures(2006)
摘要
We report on structural characterization of AlGaN/GaN superlattices grown on sapphire. The superlattice formation is evidenced by high-resolution x-ray diffraction and transmission electron microscopy. The high resolution x-ray diffraction spectra exhibit a pattern of satellite peaks. The in-plane lattice constants of the superlattices indicate the coherent growth of the AlGaN layer onto GaN. The average Al composition in the superlattices is determined to be 0.08 by Rutherford backscattering spectroscopy. The average parallel and perpendicular elastic strains for the SLs are determined to be 〈e∥〉=+0.25% and 〈e⊥〉=−0.17%.
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关键词
Nitride semiconductors,Superlattice,Rutherford backscattering/channeling,Transmission electron microscopy,X-ray diffraction
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