Improved determination of phosphorus contamination during ion implantation by SRP and simulations
Applied Surface Science(2009)
Abstract
Experimental determination of phosphorous cross-contamination during antimony implantation is presented. As a suitable structure for this experiment, a buried layer was employed which is created by implanting antimony followed by a long diffusion process. The implanted samples were analysed by SIMS and spreading resistance (SRP) methods. SRP method has been improved by applying a correction for the carrier spilling effect. A conversion chart for p–n junction depth dependence on phosphorus doping has been calculated by program SUPREM-IV. Comparison of SRP and SIMS methods has shown that SRP method can be used for monitoring the phosphorus cross-contamination and can be easily implemented as an in-line monitor and present an alternative to expensive and time consuming SIMS analysis.
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81.05.Ea,84.37.+q,85.40.Ry
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