Performance of Etched Laminar Multilayer Gratings in the Soft X-ray Region
JOURNAL OF MODERN OPTICS(2010)
摘要
Mo/C laminar multilayer amplitude gratings for use in the 1 keV or 250 eV region were fabricated by holography or electron beam lithography followed by reactive ion etching. The gratings were tested with monochromatized synchrotron radiation and their performance was compared to theoretical values.
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关键词
synchrotron radiation,electron beam lithography,reactive ion etching
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