Identification of sensitive positive and negative working resist materials for proximity X-ray lithography

Proximity x-ray lithography represents one of the emerging technologies currently under investigation for advanced circuit design fabrication. A pulsed laser point source proximity print stepper is currently being evaluated for the feasibility of fabricating working devices having design rules in the range of 0.12-0.18@mm. Both conventional and chemically amplified (CA) positive and negative working resists have been evaluated on the stepper and exhibit sensitivities in the range of 15-60mJ/cm^2. Multi- and single component positive CA resists represent the leading candidates for use in device fabrication. Negative resists provide high sensitivity but have more limited resolution capability vs. positive working materials.