Reflectance anisotropy oscillations of the heteroepitaxial growth of AlAs and Al1 − xGaxAs on GaAs(001) surfaces by molecular beam epitaxy

SURFACE SCIENCE(1997)

引用 2|浏览5
暂无评分
摘要
Reflectance anisotropy (RA) oscillations observed during the molecular beam epitaxial growth of AlAs and AlGaAs/AlAs heterostructures on singular GaAs(001) substrates have been investigated. A temperature dependence study of the AlAs oscillations was carried out in the temperature range 500-580 degrees C and oscillations of large amplitude were readily detected. The effect of alloy stoichiometry on the oscillation amplitude was investigated and the amplitude was found to decrease as the Ga content of the alloy was increased. The origin of these oscillations is discussed in terms of the microscopic nature of the step edges associated with the islands formed during growth. (C) 1997 Elsevier Science B.V.
更多
查看译文
关键词
epitaxy,gallium arsenide,molecular beam epitaxy,reflection anisotropy,reflection spectroscopy,semiconductor,single crystal surfaces,surface
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要