退火温度对化学水浴沉积CdS薄膜性能的影响
Journal of Dalian Jiaotong University（2012）
Abstract
采用化学水浴沉积法(CBD)制备了CdS薄膜,用扫描电镜(SEM)、能谱(EDS)、X射线衍射仪(XRD)、分光光度计进行检测.研究了退火温度对CdS薄膜表面形貌、成分、晶体结构和光学性能的影响.研究表明,CdS薄膜为微晶或是非晶态,S/Cd原子比在0.8左右,可见光透过率较高；随着退火温度的升高,薄膜结晶明显,但是透光率下降,禁带宽度范围在2.42～2.59eV之间.
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Key words
CdS thin film,chemical bath deposition(CBD),annealing temperature
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