SiO2薄膜热应力模拟计算

Journal of South China Normal University(Natural Science Edition)(2009)

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Abstract
薄膜内应力严重影响薄膜在实际中的应用.该文采用有限元模型对SiO2薄膜热应力进行模拟计算,验证了模型的准确性.计算了薄膜热应力的大小和分布,分析了不同镀膜温度、不同膜厚和不同基底厚度生长环境下热应力的大小,得到了相应的变化趋势图, 对薄膜现实生长具有一定的指导意义.
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Key words
SiO2 thin film,finite element,thermal stress,simulation
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