Calibration and spectroscopy with a laterally-d graded multilayer interference mirror

We realized a laterally-d graded multilayer interference mirror using a special configuration of a sputtering deposition system. Metrology of this device was done (we have found the variation of period versus the lateral position) on the SB3 beamline, a CEA calibration station located at the 'Laboratoire pour l'Utilisation du Rayonnement Electromagnetique' in Orsay. A wide set of applications was shown by studying transmission of X-ray radiation transmitted through copper metal foil, especially spectral analysis in the L absorption edge. This analysis was simply realized by translating the laterally-d graded multilayer interference mirror at a fixed glancing angle. (C) 1999 Elsevier Science B.V. All rights reserved.