SURFACE PLASMON RESONANCE ABSORPTION OF ALBUMIN/WATER ON Ni THIN FILM DEPOSITED ON Si AT 230°C

In this work we have studied the surface plasmon resonance (SPR) absorption of Albumin on NiSi nanoparticle thin film deposited on Si. The thin films were deposited by means of RF sputtering on Si at various temperatures and times for different thicknesses, and characterized by grazing angle XRD and SEM. From these experimental conditions, we only observed a formation of NiSi nanoparticles deposited on Si at 230 degrees C for 15 min to 30 min. The silicon atoms seem to emerge out of the surface and react with Nickel's. Due to the high activation energy, this mechanism would not take place at lower temperatures, such as RT and 122 degrees C. Mixture of Albumin and water with varied concentrations has been prepared for the measurement of SPR absorption on the NiSi nanoparticle thin film. We found the spectra of SPR absorption of Albumin on the sample, which NiSi nanoparticle thin film was deposited on Si at 230 degrees C, exhibits a specific shift due to the formation of NiSi nanoparticle.