Growth and characterization of CdTe:Ge:Yb

JOURNAL OF CRYSTAL GROWTH(2008)

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摘要
Cadmium telluride (CdTe) crystals and epitaxial layers were grown by the vertical Bridgman method and vapor-phase epitaxy, respectively, to obtain the high-resistive material suitable for X- and gamma-ray detectors. The crystals and layers were doped with Ge at the concentration of 5×1017cm−3 and co-doped with the rare element Yb at the concentration range from 1×1017 to 1×1019cm−3. The CdTe:Ge:Yb samples were studied by the structural and electrical characterization techniques, low-temperature photoluminescence (PL) and cathodoluminescence (CL) spectroscopy and CL imaging.
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关键词
Bridgman technique,vapor-phase epitaxy,CdTe,semiconducting II-VI
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