The Effect of an Electrode on Plasma Potential Dip in RIKEN 18 GHz Electron Cyclotron Resonance Ion Source

Takahide Nakagawa,Sandor Biri,Masanori Kidera,Yoshitoshi Miyazawa,Masatake Hemmi,Toshiya Chiba,Naohito Inabe,Masayuki Kase,Tadashi Kageyama,Osamu Kamigaito,Akira Goto,Yasushige Yano

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS（1998）

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摘要

We measured the beam intensity of argon ions as a function of negative bias voltage of an electrode under the pulsed mode operation. We observed that the potential dip becomes deeper by increasing negative bias voltage. We concluded that the electrode works to optimize the plasma potential and helps to increase the beam intensity of highly charged argon ions.

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关键词

electron cyclotron resonance ion source,highly charged argon ions,biased electrode,plasma potential,potential dip

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