38.2: Deposition of Highly Conductive ITO Thin Films for Display Applications with the rf/dc Process

With the ARISTO 500S inline sputtering system highly conductive ITO-films with specific resistivities of less than 150 μΩcm were deposited at substrate temperatures of 200 °C using an RF-superimposed DC-magnetron process. Hall effect measurements and investigations of the film structure gave an deeper insight into the conduction mechanism.