Application of Calixarene for nanometer magnetic particle fabrication
MNE '99 Proceedings of the 25th international conference on Microelectronic engineering（2000）
摘要
An application of negative tone electron beam resist Calixarene for fabrication of nanometer magnetic particle is reported. Thoroughly resist characterisation is performed. Proximity tests for characterization of the intraproximity behaviour of the resist on tested substrate is investigated to compensate for modulation of lateral dimensions due to electron scattering. Magnetic particles were fabricated by a combination of EBL and ion beam milling using directly Calixarene as a transfer layer down to Fe. We fabricated arrays of circular particles with characteristic dimensions down to 40nm. Initial results of topographic and magnetic force microscopy are reported.
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关键词
nanometer magnetic particle fabrication,intraproximity behaviour,initial result,negative tone electron beam,circular particle,magnetic force microscopy,characteristic dimension,ion beam milling,nanometer magnetic particle,magnetic particle,lateral dimension,particle size,nanotechnology,ion beam,nanoparticles,ferromagnetic materials,iron,atomic force microscopy,magnetic particles,surface topography,electron beam,electron scattering
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