X-Ray Photoelectron Spectroscopy Characterization of Diamond Thin Film Surfaces for Electronic Device Application

Diamond thin film surfaces after the deposition of fluoride and nitride have been characterized by X-ray photoelectron spectroscopy to investigate the chemical bonding. A considerable shift to the higher energy side in the peaks of the C 1s level was observed in the sample with CaF2 deposited at 500 degrees C. The data suggest that the fluorination proceeds on the diamond surface via the deposition of CaF2 and that the degree of fluorination depends on the kind of adatoms present on the diamond surface before the deposition of CaF2.