Topology Of Twin Junctions In Epitaxial Beta-Sic
DIAMOND AND RELATED MATERIALS(1997)
Abstract
The island growth of beta-SiC on vicinal (001) Si is studied by HREM and AFM. The initial nuclei have the morphology of tetragonal pyramids, Growth proceeds by a dendritic mechanism resulting in a large density of primary twins and stacking faults. The density of planar defects is reduced dramatically with increasing distance from the substrate. Mutual twin annihilation was studied taking into account interfacial connectivity principles developed recently. The secondary defects that are geometrically necessary for such a mechanism were identified. It has been shown that, for the formation of closed defect topologies, junction lines of planar defects are introduced. This has been verified using computer simulation of HREM images. (C) 1997 Elsevier Science S.A.
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Key words
planar defects, interfacial connectivity, epitaxial beta-SiC
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