Non-Destructive Microwave Characterization Of Ferroelectric Films On Conductive Substrates

Limitations, and detailed accuracy analysis are provided for microwave dielectric characterization of ferroelectric films, sandwiched between two thin film electrodes, and under DC electric bias field. Electrodynamic simulations are carried out, and test structures with different electrode shape/size are fabricated and measured to check the accuracy of simple analytic formulas. It is shown that using this simple method the permittivity and loss tangent of ferroelectric films maybe measured at frequencies up to 50 GHz and above. The accuracy of measurement is rather high and in extreme cases not worse than 20%.