Electron beam physical vapour deposition of protective films on carbon reinforced carbon

Cr and Ti films on C/C-SiC substrates were obtained by ion assisted electron beam physical vapour deposition (IA EBPVD) and EBPVD, interrupting the deposition process and annealing the substrates. The morphology and properties of the films were studied using optical microscopy, scanning electron microscopy and X-ray diffraction (XRD) methods. Ion bombardment of the surface during the metal deposition has an influence on the structure of the grown films: by increasing the ion energy from 200 V to 700 V, the grain sizes are more uniform. X-ray investigations show that residual silicon has an influence on the initial stage of chromium deposition. XRD was also used for measurement of the residual stresses, which depend on the ion energy. (C) 2000 Elsevier Science S.A. All rights reserved.