Monte Carlo study of high performance resists for SCALPEL nanolithography

L. E. Ocola,W-Y. Li,R. J. Kasica,M BLAKEY,P. A. Orphanos,W. K. Waskiewicz,A. E. Novembre,M. Sato

MNE '99 Proceedings of the 25th international conference on Microelectronic engineering（2000）

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摘要

Traditionally, lithography has been the driving force behind the exponential growth rate of Microelectronics, thanks also to the easy scalability of MOS devices. Even if up to now every prophecy for a slow-down of the growth rate has been proven false, ...

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关键词

mos device,easy scalability,driving force,exponential growth rate,monte carlo study,high performance,growth rate,scalpel nanolithography,high resolution,high throughput,monte carlo simulation

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